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Edwards EO6 depostion system
Diffusion pumped system to 10-6 Torr
DC and RF sputtering
Thermal evaporation of up to 2 sources sequentially
Substrate heating to 400°C
Thickness monitoring via quartz crystal microbalance
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Denton Turbo depostion system
Turbo pumped system to 10-6 Torr
Thermal evaporation of up to 2 sources sequentially
Substrate heating to 400°C
Thickness monitoring via quartz crystal microbalance
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Dynavac CE12-14s Evaporation System
Diffusion pumped system to 10-6 Torr
DC and RF sputtering of 2 sources simultaneously
Reactive sputtering with Oxygen atmosphere
Substrate heating to 400°C
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Shannon E-beam Evaporation System
Diffusion pumped system to 10-6 Torr
E-beam evaporation
Substrate heating to 400°C
Thickness monitoring via quartz crystal microbalance
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